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Awards

ALD Student Award Finalist Talk: "Electron-Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using (DMBD)Ru(CO)3."

Research and Personal Interests

Research areas of interest include atomic layer deposition (ALD), atomic layer etching (ALE), and electron enhanced ALD. Thin film processing and metrology are critical to driving semiconductor technologies forward. As transistor sizes continue to shrink, the demand for highly precise deposition and etching techniques for both common and novel materials increases. I focus primarily on electron enhanced ALD, one of the many novel semiconductor processes the George group works on.

In my free time, I enjoy fly fishing, snowboarding, cooking, video games and soccer.